Multiple exposure method

专利名称：Multiple exposure method发明人：Mitsuro Sugita,Miyoko Kawashima申请号：US09337040申请日：19990628公开号：US069307B1公开日：20050816

专利附图：

摘要：An exposure apparatus includes a first exposure device for illuminating apredetermined mask with light of a predetermined wavelength under a first illuminationcondition, to print a first pattern on a predetermined exposure region, and a secondexposure device for illuminating the mask with light of the predetermined wavelength

under a second illumination condition, different from the first illumination condition, toprint a second pattern on the predetermined exposure region, in which the mask has adesired pattern and an auxiliary pattern having a shape different from that of the desiredpattern, and a first exposure by the first exposure device and a second exposure by thesecond exposure device are carried out prior to a development process.

申请人：Mitsuro Sugita,Miyoko Kawashima

地址：Utsunomiya JP,Utsunomiya JP

国籍：JP,JP

代理机构：Fitzpatrick, Cella, Harper & Scinto

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