专利名称:Multiple exposure method发明人:Mitsuro Sugita,Miyoko Kawashima申请号:US09337040申请日:19990628公开号:US069307B1公开日:20050816
专利附图:
摘要:An exposure apparatus includes a first exposure device for illuminating apredetermined mask with light of a predetermined wavelength under a first illuminationcondition, to print a first pattern on a predetermined exposure region, and a secondexposure device for illuminating the mask with light of the predetermined wavelength
under a second illumination condition, different from the first illumination condition, toprint a second pattern on the predetermined exposure region, in which the mask has adesired pattern and an auxiliary pattern having a shape different from that of the desiredpattern, and a first exposure by the first exposure device and a second exposure by thesecond exposure device are carried out prior to a development process.
申请人:Mitsuro Sugita,Miyoko Kawashima
地址:Utsunomiya JP,Utsunomiya JP
国籍:JP,JP
代理机构:Fitzpatrick, Cella, Harper & Scinto
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