MEASUREMENT METHOD, EXPOSURE METHOD, EXPOSURE APPA

专利名称：MEASUREMENT METHOD, EXPOSURE

METHOD, EXPOSURE APPARATUS, ANDDEVICE FABRICATION METHOD

发明人：Kenji Yamazoe申请号：US11971506申请日：20080109

公开号：US20080170240A1公开日：20080717

专利附图：

摘要：A method for measuring a synchronization error between a first stage and asecond stage in a scanning exposure apparatus including the first stage which supports a

reticle, the second stage which supports a substrate, and a projection optical systemwhich projects a pattern of the reticle onto the substrate, the method comprises thesteps of measuring, using a measurement unit, a light intensity distribution formed by ameasurement pattern while synchronously scanning a measurement mask which has themeasurement pattern and is arranged on the first stage, and the measurement unitarranged on the second stage, and calculating the synchronization error between thefirst stage and the second stage based on a time change in the light intensity distributionmeasured in the measuring step.

申请人：Kenji Yamazoe

地址：Utsunomiya-shi JP

国籍：JP

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